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Silicon Chemical Vapor Deposition (CVD) on microporous powders in a fluidized bed

✍ Scribed by S Kouadri-Mostefa; P Serp; M Hémati; B Caussat


Book ID
114079398
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
179 KB
Volume
120
Category
Article
ISSN
0032-5910

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Silicon Chemical Vapor Deposition on mac
✍ L. Cadoret; N. Reuge; S. Pannala; M. Syamlal; C. Rossignol; J. Dexpert-Ghys; C. 📂 Article 📅 2009 🏛 Elsevier Science 🌐 English ⚖ 837 KB

Titanium oxide (TiO 2 ) submicron powders have been treated by Chemical Vapor Deposition (CVD) in a vibrofluidized bed in order to deposit silicon layers of nanometer scale on each individual grain from silane (SiH 4 ). Experimental results show that for the conditions tested, the original granular

Silicon CVD on powders in fluidized bed:
✍ L. Cadoret; N. Reuge; S. Pannala; M. Syamlal; C. Coufort; B. Caussat 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 875 KB

The Computational Fluid Dynamics code MFIX was used for transient simulations of silicon Fluidized Bed Chemical Vapor Deposition (FBCVD) from silane (SiH 4 ) on coarse alumina powders. FBCVD experiments were first performed to obtain a reference database for modelling. Experimental thermal profiles