Titanium oxide (TiO 2 ) submicron powders have been treated by Chemical Vapor Deposition (CVD) in a vibrofluidized bed in order to deposit silicon layers of nanometer scale on each individual grain from silane (SiH 4 ). Experimental results show that for the conditions tested, the original granular
✦ LIBER ✦
Silicon Chemical Vapor Deposition (CVD) on microporous powders in a fluidized bed
✍ Scribed by S Kouadri-Mostefa; P Serp; M Hémati; B Caussat
- Book ID
- 114079398
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 179 KB
- Volume
- 120
- Category
- Article
- ISSN
- 0032-5910
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