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Chemical vapor deposition and homogeneous nucleation in fluidized bed reactors: silicon from silane

✍ Scribed by S. Lai; M.P. Dudukovic'; P.A. Ramachandran


Book ID
107730232
Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
704 KB
Volume
41
Category
Article
ISSN
0009-2509

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Silicon Chemical Vapor Deposition on mac
✍ L. Cadoret; N. Reuge; S. Pannala; M. Syamlal; C. Rossignol; J. Dexpert-Ghys; C. πŸ“‚ Article πŸ“… 2009 πŸ› Elsevier Science 🌐 English βš– 837 KB

Titanium oxide (TiO 2 ) submicron powders have been treated by Chemical Vapor Deposition (CVD) in a vibrofluidized bed in order to deposit silicon layers of nanometer scale on each individual grain from silane (SiH 4 ). Experimental results show that for the conditions tested, the original granular