๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Short-channel effects and drain-induced barrier lowering in nanometer-scale GaAs MESFET's

โœ Scribed by Adams, J.A.; Thayne, I.G.; Wilkinson, C.D.W.; Beaumont, S.P.; Johnson, N.P.; Kean, A.K.; Stanley, C.R.


Book ID
114535132
Publisher
IEEE
Year
1993
Tongue
English
Weight
592 KB
Volume
40
Category
Article
ISSN
0018-9383

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Substrate bias effects on drain-induced
โœ Z.X. Yan; M.J. Deen ๐Ÿ“‚ Article ๐Ÿ“… 1990 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 578 KB

Experimental results on the substrate biasing characteristics of drain-induced barrier lowering (DIBL) in short channel PMOS devices with boron ion channel doping at 77 K are presented in detail. It was found that as the channel length decreased, the threshold voltage shift caused by DIBL first incr