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Comparison of drain-induced barrier-lowering in short-channel NMOS and PMOS devices at 77 K

โœ Scribed by Z.X. Yan; M.J. Deen


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
483 KB
Volume
34
Category
Article
ISSN
0038-1101

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๐Ÿ“œ SIMILAR VOLUMES


Substrate bias effects on drain-induced
โœ Z.X. Yan; M.J. Deen ๐Ÿ“‚ Article ๐Ÿ“… 1990 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 578 KB

Experimental results on the substrate biasing characteristics of drain-induced barrier lowering (DIBL) in short channel PMOS devices with boron ion channel doping at 77 K are presented in detail. It was found that as the channel length decreased, the threshold voltage shift caused by DIBL first incr