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Selectivity and Si-load in deep trench etching

✍ Scribed by K. Paul Mu¨ller; Klaus Roithner; Hans-Jo¨rg Timme

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 508 KB
Volume: 27
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(94)00145-k

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