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Selective dry etching of (Sc2O3)x(Ga2O3)1−xgate dielectrics and surface passivation films on GaN

✍ Scribed by M. Hlad; L. Voss; B. P. Gila; C. R. Abernathy; S. J. Pearton; F. Ren


Book ID
107453630
Publisher
Springer US
Year
2006
Tongue
English
Weight
134 KB
Volume
35
Category
Article
ISSN
0361-5235

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GaN nanowires and nanorods have been successfully synthesized on Si(1 1 1) substrates by magnetron sputtering through ammoniating Ga 2 O 3 / V films at 900 8C in a quartz tube. X-ray diffraction (XRD), scanning electron microscopy (SEM), high-resolution transmission electron microscopy (HRTEM), X-ra