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Preparation and characterization of Ga2xIn2(1−x)O3 films deposited on ZrO2 (1 0 0) substrates by MOCVD

✍ Scribed by Lingyi Kong; Jin Ma; Fan Yang; Caina Luan; Zhen Zhu

Book ID: 116606360
Publisher: Elsevier Science
Year: 2010
Tongue: English
Weight: 669 KB
Volume: 499
Category: Article
ISSN: 0925-8388
DOI: 10.1016/j.jallcom.2010.02.092

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