Selective deposition of functionalized nano-objects by nanoxerography
β Scribed by Livia Seemann; Andreas Stemmer; Nicola Naujoks
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 482 KB
- Volume
- 84
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
We report a widely applicable and highly controlled approach, based on electron beam lithography (EBL), to interconnect single nano-objects, previously immobilized onto solid surfaces, and to investigate the transport properties at the level of single nanostructures. In particular, a threestep EBL-p
Recent studies show that the self-assembled monolayer (SAM) is well suited to control the selectivity of chemical vapor deposition (CVD). Here, we reported the selective CVD for copper on the functionalized SAM surfaces (with -SH, -SS-, and -SO 3 H terminal groups). The -SS-and -SO 3 H terminal grou
In order to utilize Ag nano-particles into micro-nano-devices, they need to be selectively deposited as a sub-micrometer scale to form the patterns. Self-assembled monolayer (SAM) can modify the surface properties of substrate according to its terminal functional groups. Especially, the hydrophobic