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Interconnection of specific nano-objects by electron beam lithography — A controllable method

✍ Scribed by A. Della Torre; P.P. Pompa; L.L. del Mercato; R. Chiuri; R. Krahne; G. Maruccio; L. Carbone; L. Manna; R. Cingolani; R. Rinaldi; S. Shiv Shankar; M. Sastry


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
333 KB
Volume
28
Category
Article
ISSN
0928-4931

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✦ Synopsis


We report a widely applicable and highly controlled approach, based on electron beam lithography (EBL), to interconnect single nano-objects, previously immobilized onto solid surfaces, and to investigate the transport properties at the level of single nanostructures. In particular, a threestep EBL-procedure was used for this purpose by patterning two planar contacts on the sides of an individual nano-object. To demonstrate this approach, we use two different kinds of active elements: a semiconductor nanocrystal (tetrapod) and a thin triangular gold nanoprism (NT).