Selective deposition of the silver nano-particles using patterned the hydrophobic self-assembled monolayer patterns and zero-residual nano-imprint lithography
✍ Scribed by Ki-Yeon Yang; Jong-Woo Kim; Kyeong-Jae Byeon; Heon Lee
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 539 KB
- Volume
- 84
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.
✦ Synopsis
In order to utilize Ag nano-particles into micro-nano-devices, they need to be selectively deposited as a sub-micrometer scale to form the patterns. Self-assembled monolayer (SAM) can modify the surface properties of substrate according to its terminal functional groups. Especially, the hydrophobic SAM can drastically reduce the surface energy of substrate and it may be applied to the various selective deposition applications. In this study, the trichlorosilane based hydrophobic SAM was patterned by the zero-residual layer nano-imprint lithography and Ag nano-particles were selectively deposited to form a sub-micrometer sized patterns.