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Role of xenon additive in microwave plasma-assisted (H[sub 2]+CH[sub 4]) chemical vapor deposition of diamond thin film

✍ Scribed by Hosomi, Takeshi; Maki, Tetsuro; Kobayashi, Takeshi; Yoshizako, Yuji; Taniguchi, Michio; Sugiyo, Masato

Book ID: 120985808
Publisher: American Institute of Physics
Year: 1998
Tongue: English
Weight: 525 KB
Volume: 84
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.368916

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## Abstract In this work, we study the influence of oxygen additive in the gas phase on hydrogen impurity incorporation into thick nanocrystalline diamond (NCD) films. Various diamond samples were grown on large silicon wafers of 5.08 cm diameter by adjusting the amount of oxygen and nitrogen addit