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Low temperature growth of diamond films by microwave plasma chemical vapor deposition using CH4 +CO2 gas mixtures

โœ Scribed by Chen, Chia-Fu; Chen, Sheng-Hsiung; Ko, Hsien-Wen; Hsu, S.E.

Book ID
121385963
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
726 KB
Volume
3
Category
Article
ISSN
0925-9635

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Growth of diamond films from microwave p
Growth of diamond films from microwave plasma in CH4-CO2 mixtures
โœ G. Balestrino; M. Marinelli; E. Milani; A. Paoletti; P. Paroli; I. Pinter; A. Te ๐Ÿ“‚ Article ๐Ÿ“… 1993 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 392 KB

We have studied the growth of diamond films from microwave plasma using gas mixtures of CH,-CO, (not previously reported in the literature) onto Si substrates. The diamond phase is obtained in the molar ratio .range 0.7 <CO,/ CH, G 1.38 -C 0.05, in close agreement with the empirical model of Bachman