Growth of diamond films from microwave plasma in CH4-CO2 mixtures

✍ Scribed by G. Balestrino; M. Marinelli; E. Milani; A. Paoletti; P. Paroli; I. Pinter; A. Tebano; G. Luce

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 392 KB
• Volume: 185
• Category: Article
• ISSN: 0921-4526
• DOI: 10.1016/0921-4526(93)90219-v

✦ Synopsis

We have studied the growth of diamond films from microwave plasma using gas mixtures of CH,-CO, (not previously reported in the literature) onto Si substrates. The diamond phase is obtained in the molar ratio .range 0.7 <CO,/ CH, G 1.38 -C 0.05, in close agreement with the empirical model of Bachmann et al., with relevant implications for the diamond precursor species. The film morphology varies appreciably in the above range, the best films being obtained just at the border with the no-growth region.