Defects in Device Grade Homoepitaxial Diamond Thin Films Grown with Ultra-Low CH4/H2 Conditions by Microwave-Plasma Chemical Vapor Deposition

✍ Scribed by Takeuchi, D. ;Watanabe, H. ;Yamanaka, S. ;Okushi, H. ;Kajimura, K.

• Publisher: John Wiley and Sons
• Year: 1999
• Tongue: English
• Weight: 487 KB
• Volume: 174
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/(sici)1521-396x(199907)174:1<101::aid-pssa101>3.0.co;2-o