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Role of ions in formation of amorphous Si:H network in electron cyclotron resonance plasma chemical vapor deposition

✍ Scribed by Yoshikazu Nakayama; Kohji Hitsuishi; Mei Zhang; Hiroshi Imamura; Takao Kawamura

Book ID: 117147084
Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 283 KB
Volume: 137-138
Category: Article
ISSN: 0022-3093
DOI: 10.1016/s0022-3093(05)80209-1

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