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Reservoir effect on electromigration mechanisms in dual-damascene Cu interconnect structures

✍ Scribed by A.V. Vairagar; S.G. Mhaisalkar; M.A. Meyer; E. Zschech; Ahila Krishnamoorthy

Book ID: 108207516
Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 224 KB
Volume: 82
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2005.07.076

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