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A direct measurement of electromigration induced drift velocity in Cu dual damascene interconnects

✍ Scribed by M.Y. Yan; K.N. Tu; A.V. Vairagar; S.G. Mhaisalkar; Ahila Krishnamoorthy

Book ID: 104057888
Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 221 KB
Volume: 46
Category: Article
ISSN: 0026-2714
DOI: 10.1016/j.microrel.2005.11.004

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