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Refractive index behavior of boron-doped silica films by plasma-enhanced chemical vapor deposition

✍ Scribed by R.H. Horng; F. Chen; D.S. Wuu; T.Y. Lin

Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 274 KB
Volume: 92
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(95)00261-8

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