๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Reduction of secondary defect formation in MeV As ion implanted Si(100)

โœ Scribed by R.J. Schreutelkamp; W.X. Lu; J.R. Liefting; V. Raineri; J.S. Custer; F.W. Saris


Book ID
113281608
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
559 KB
Volume
59-60
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES