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Formation and annealing behavior of prominent point defects in MeV ion implanted n-type epitaxial Si

โœ Scribed by L. Vines; E.V. Monakhov; J. Jensen; A.Yu. Kuznetsov; B.G. Svensson


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
670 KB
Volume
159-160
Category
Article
ISSN
0921-5107

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