Change of the electron effective mass in extremely heavily doped n-type Si obtained by ion implantation and laser annealing

✍ Scribed by M. Miyao; T. Motooka; N. Natsuaki; T. Tokuyama

• Publisher: Elsevier Science
• Year: 1981
• Tongue: English
• Weight: 313 KB
• Volume: 37
• Category: Article
• ISSN: 0038-1098
• DOI: 10.1016/0038-1098(81)90144-7