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Reduction of resistivity in Cu thin films by partial oxidation: Microstructural mechanisms

โœ Scribed by Prater, Walter L.; Allen, Emily L.; Lee, Wen-Y.; Toney, Michael F.; Daniels, Jonathan; Hedstrom, Jonathan A.

Book ID
120592262
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
392 KB
Volume
84
Category
Article
ISSN
0003-6951

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