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Reduction of Dislocation Density in HVPE-Grown GaN Epilayers by Using In Situ-Etched Porous Templates

✍ Scribed by Zhao, Z. D.; Wang, B.; Sui, Y. P.; Xu, W.; Li, X. L.; Yu, G. H.


Book ID
121422067
Publisher
Springer US
Year
2013
Tongue
English
Weight
358 KB
Volume
43
Category
Article
ISSN
0361-5235

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## Abstract GaN overlayers for the purpose of reducing extended defects have been grown by MOCVD on porous network of TiN thin layers which in turn were achieved by __in situ__ nitridation of thin Ti layers (20 nm and 10 nm) on a GaN template. TEM analyses performed for the GaN layer with 20 nm TiN