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Reduction of charge trapping in HfO 2 film on a Ge substrate by trimethylaluminum pretreatment

✍ Scribed by Lee, Jae Jin; Shin, Yunsang; Choi, Juyun; Kim, Hyoungsub; Hyun, Sangjin; Choi, Siyoung; Cho, Byung Jin; Lee, Seok-Hee

Book ID: 118766690
Publisher: John Wiley and Sons
Year: 2012
Tongue: English
Weight: 334 KB
Volume: 6
Category: Article
ISSN: 1862-6254
DOI: 10.1002/pssr.201206315

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