✦ LIBER ✦
Investigation of voltage dependent relaxation, charge trapping, and stress induced leakage current effects in HfO[sub 2]∕Dy[sub 2]O[sub 3] gate stacks grown on Ge (100) substrates
✍ Scribed by Rahman, M. S.; Evangelou, E. K.; Androulidakis, I. I.; Dimoulas, A.; Mavrou, G.; Tsipas, P.
- Book ID
- 121721107
- Publisher
- AVS (American Vacuum Society)
- Year
- 2009
- Tongue
- English
- Weight
- 471 KB
- Volume
- 27
- Category
- Article
- ISSN
- 0734-211X
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