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Redistribution of ytterbium and oxygen in annealing of silicon layers amorphized by implantation

✍ Scribed by O. V. Aleksandrov; Yu. A. Nikolaev; N. A. Sobolev; R. Asomoza; Yu. Kudriavtsev; A. Villegas; A. Godines

No coin nor oath required. For personal study only.

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