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Recystallization characteristics of polycrystalline silicon films amorphized by germanium ion implantation

✍ Scribed by Myeon-Koo Kang; Kenichi Akashi; Takayuki Matsui; Hiroshi Kuwano

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 806 KB
Volume: 38
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(94)00112-s

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