Recent developments in inverted cylindrical magnetron sputtering
โ Scribed by David A Glocker; Mark M Romach; Vern W Lindberg
- Book ID
- 108422970
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 182 KB
- Volume
- 146-147
- Category
- Article
- ISSN
- 0257-8972
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
The substrate temperature achieved during physical vapor deposition significantly affects the properties and phases of thin films. An Isoflux ICM-10 Dual Target Inverted Cylindrical Magnetron Sputtering system is used to deposit low temperature alpha-phase alumina, for which an experimentally determ
The novel physical vapor deposition called inverted cylindrical magnetron sputtering (also known as hollow cathode sputtering) is commonly used to coat wires, fibers, ribbons as well as all sides of three-dimensional substrates. It is a reproducible method for the production of nanostructured system