The novel physical vapor deposition called inverted cylindrical magnetron sputtering (also known as hollow cathode sputtering) is commonly used to coat wires, fibers, ribbons as well as all sides of three-dimensional substrates. It is a reproducible method for the production of nanostructured system
โฆ LIBER โฆ
HTSC thin film growth by inverted cylindrical magnetron sputtering
โ Scribed by J. Geerk; G. Linker; O. Meyer
- Book ID
- 104843066
- Publisher
- Springer
- Year
- 1992
- Tongue
- English
- Weight
- 568 KB
- Volume
- 5
- Category
- Article
- ISSN
- 0896-1107
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