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Real time spectroscopic ellipsometry for characterization of nucleation, growth, and optical functions of thin films

✍ Scribed by R.W. Collins; Ilsin An; H.V. Nguyen; Yiwei Lu

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
825 KB
Volume
233
Category
Article
ISSN
0040-6090

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## Abstract In‐situ temperature measurement is essential in CVD in order to control the temperature of the growing films. This is frequently achieved by optical pyrometry because it is a sensitive, convenient, and inexpensive technique that can be used in corrosive atmospheres. In this work, in‐sit