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Real-time process control with in situ spectroscopic ellipsometry

✍ Scribed by Blaine Johs; Jeff Hale; James Hilfiker

Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
390 KB
Volume
10
Category
Article
ISSN
0961-1290

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✦ Synopsis

~ Real-time monitoring and control are considered essential for the manufacture of next-generation epitaxially grown semiconductor device structures. In situ spectroscopic ellipsometry has demonstrated the precise film characterization required to achieve acceptable yields.

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Principle and limitations of real time spectroscopic ellipsometry are presented. The technical characteristics of the SOPRA ES4G OMA system are summarised and illustrated by practical examples. With 1024 pixels in a spectral range of 260-1060 nm, a reproducibility better than 10 -3 and the possibili