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Real-time evaluation of the concentration of impurities during organic solution crystallization

✍ Scribed by L Derdour; G Févotte; F Puel; P Carvin


Book ID
114079774
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
286 KB
Volume
129
Category
Article
ISSN
0032-5910

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## Abstract The transient surface temperature and optical transmissivity profiles during the plasma annealing of amorphous silicon (a‐Si) on quartz substrate was studied using a radio‐frequency (rf) thermal plasma torch (TPT). The film crystallization promoted through solid‐phase crystallization (S