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Reactive pulsed magnetron sputtering process for alumina films

✍ Scribed by Kelly, P. J.; Henderson, P. S.; Arnell, R. D.; Roche, G. A.; Carter, D.

Book ID: 125469368
Publisher: AVS (American Vacuum Society)
Year: 2000
Tongue: English
Weight: 502 KB
Volume: 18
Category: Article
ISSN: 0734-2101
DOI: 10.1116/1.1319679

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