𝔖 Bobbio Scriptorium

✦ LIBER ✦

Reactive low voltage ion plating of aluminium nitride films and their characteristics

✍ Scribed by Nguyen Quang Danh; K.H. Monz; H.K. Pulker

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 697 KB
Volume: 257
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(94)06348-6

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Untersuchung des Plasmas für das reaktiv

Untersuchung des Plasmas für das reaktive Niedervolt-Ionenplattieren. Study of the plasma of the reactive low voltage ion plating process

✍ G. N. Strauss; H. K. Pulker 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 133 KB

Preparation of titanium nitride films by

Preparation of titanium nitride films by reactive ion plating and the influence of discharge current density on the film properties : A. Rousseau and J. Guille. Vacuum 38, 443 (1988)

📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 123 KB

Preparation of titanium nitride films by

Preparation of titanium nitride films by reactive ion plating and the influence of discharge current density on the film properties: A Rousseau and J Guille, Vacuum, 38, 1988, 443–448

📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 306 KB

Dielectric and ac conduction properties

Dielectric and ac conduction properties of ion plated aluminium nitride thin films: D Mangalaraj et al, J Phys D: Appl Phys, 15 (3), 1982, 467–472

📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 177 KB