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Reactive ion plating (RIP) with auxiliary discharge and the influence of the deposition conditions on the formation and properties of TiN films

โœ Scribed by W. Fleischer; D. Schulze; R. Wilberg; A. Lunk; F. Schrade


Book ID
107862567
Publisher
Elsevier Science
Year
1979
Tongue
English
Weight
435 KB
Volume
63
Category
Article
ISSN
0040-6090

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