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Reactive ion etching of Si/SiGe in CF4/Ar and Cl2/BCl3/Ar discharges

✍ Scribed by S.J. Chang; Y.Z. Juang; D.K. Nayak; Y. Shiraki

Book ID: 114194627
Publisher: Elsevier Science
Year: 1999
Tongue: English
Weight: 369 KB
Volume: 60
Category: Article
ISSN: 0254-0584
DOI: 10.1016/s0254-0584(99)00034-6

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