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The etching properties of Al2O3 thin films in N2/Cl2/BCl3 and Ar/Cl2/BCl3 gas chemistry

✍ Scribed by Seong-Mo Koo; Dong-Pyo Kim; Kyoung-Tae Kim; Chang-Il Kim

Book ID
108215148
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
261 KB
Volume
118
Category
Article
ISSN
0921-5107

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