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Reactive ion etching of silicon oxynitride formed by plasma-enhanced chemical vapor deposition

✍ Scribed by Ueno, Kazuyoshi

Book ID: 121253096
Publisher: AVS (American Vacuum Society)
Year: 1995
Tongue: English
Weight: 418 KB
Volume: 13
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.588169

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