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Reactive ion etching in the fabrication of niobium tunnel junctions

✍ Scribed by Reible, S.


Book ID
114645183
Publisher
IEEE
Year
1981
Tongue
English
Weight
562 KB
Volume
17
Category
Article
ISSN
0018-9464

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Refractive microlenses are formed in semiconductor materials by transfer of a lens-like shape of reflowed erodable polyimide mask into the substrate by reactive ion etching. Simultaneous monitoring of the etch rates of the mask material and the semiconductor results in precise control of the lens ra