✦ LIBER ✦
The influence of He addition on Cl-etching procedure for Si-nanoscale structure fabrication using reactive ion etching system
✍ Scribed by M.Y. Jung; S.S. Choi; J.W. Kim; D.W. Kim
- Book ID
- 117215459
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 363 KB
- Volume
- 482-485
- Category
- Article
- ISSN
- 0039-6028
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