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Reactive DC magnetron sputtered zirconium nitride (ZrN) thin film and its characterization

✍ Scribed by Subramanian, B; Ashok, K; Sanjeeviraja, C; Kuppusami, P; Jayachandran, M

Book ID
115447821
Publisher
Institute of Physics
Year
2008
Tongue
English
Weight
992 KB
Volume
114
Category
Article
ISSN
1742-6588

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## Abstract Thin films of about 1ΞΌm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and aluminum. X‐ray diffraction (XRD) analysis showed that the TiAlN phase had