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Rapid thermal processing reliability of titanium silicide implanted with arsenic, boron and phosphorus

✍ Scribed by F. La Via; V. Privitera; E. Rimini

Book ID: 103615858
Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 501 KB
Volume: 53
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(91)90289-v

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