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Rapid thermal annealing of metastable and stable Si/Si1−xGex heterojunction bipolar transistors

✍ Scribed by Z.A. Shafi; A.S.R. Martin; J. Whitehurst; P. Ashburn; D.J. Godfrey; C.J. Gibblings; I.R.C. Post; C.G. Tuppen; G.R. Booker; M.E. Jones

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