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Rapid crystallization of silicon films using Joule heating of metal films

✍ Scribed by T. Sameshima; Y. Kaneko; N. Andoh


Book ID
106024077
Publisher
Springer
Year
2001
Tongue
English
Weight
206 KB
Volume
73
Category
Article
ISSN
1432-0630

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Crystallization of silicon thin films by
✍ Gwo-Mei Wu; Chen-Yen Wu πŸ“‚ Article πŸ“… 2007 πŸ› John Wiley and Sons 🌐 English βš– 237 KB

## Abstract A modified crystallization process using current‐induced joule heating under vacuum is presented. A thin layer of high temperature resistant tungsten was sputtered on the amorphous silicon as the conducting and annealing medium. The thin film thickness was measured by α‐stepper. The hig