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Raman study of thin films of amorphous-to-microcrystalline silicon prepared by hot-wire chemical vapor deposition

✍ Scribed by D. Han; J. D. Lorentzen; J. Weinberg-wolf; L. E. Mcneil; Q. Wang

Book ID: 121849841
Publisher: American Institute of Physics
Year: 2003
Tongue: English
Weight: 258 KB
Volume: 94
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.1598298

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