Comparative study of microcrystalline silicon films prepared in low or high pressure regime by hot-wire chemical vapor deposition

✍ Scribed by C Niikura; J Guillet; R Brenot; B Equer; J.E Bourée; C Voz; D Peiro; J.M Asensi; J Bertomeu; J Andreu

• Book ID: 117150270
• Publisher: Elsevier Science
• Year: 2000
• Tongue: English
• Weight: 150 KB
• Volume: 266-269
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/s0022-3093(99)00738-3