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Doping of amorphous and microcrystalline silicon films deposited by hot-wire chemical vapor deposition using phosphine and trimethylboron

โœ Scribed by Brogueira, P.; Chu, V.; Ferro, A. C.; Conde, J. P.


Book ID
111900568
Publisher
AVS (American Vacuum Society)
Year
1997
Tongue
English
Weight
548 KB
Volume
15
Category
Article
ISSN
0734-2101

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