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Amorphous and microcrystalline silicon films deposited by hot-wire chemical vapor deposition at filament temperatures between 1500 and 1900 °C

✍ Scribed by Brogueira, P.; Conde, J. P.; Arekat, S.; Chu, V.

Book ID: 120063909
Publisher: American Institute of Physics
Year: 1996
Tongue: English
Weight: 552 KB
Volume: 79
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.362501

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