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Raman scattering study of a GaAsN epitaxial layer

✍ Scribed by G.Y. Yu; Z.X. Shen; L. Liu; W.X. Sun


Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
111 KB
Volume
4
Category
Article
ISSN
1369-8001

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✦ Synopsis


Raman scattering study of a dilute GaAsN epitaxy layer was carried out at variable temperature and pressure. The localization due to the presence of the N atoms is responsible for the small correlation length in the GaAsN alloy, which is also evident from the broadening and asymmetry of the LO mode of the GaAs-like Raman band. The temperature dependence of the correlation length was analyzed. Nitrogen-induced localization also has a strong influence on the pressure dependence of the Born's effective dynamic charge e Γƒ:


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