Microstructure and composition of TiC/a-
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A.A. El Mel; B. Angleraud; E. Gautron; A. Granier; P.Y. Tessier
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Article
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2010
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Elsevier Science
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English
β 441 KB
Titanium containing amorphous carbon (TiC/a-C:H) films were deposited by a hybrid IPVD/PECVD (Ionized Physical Vapor Deposition/Plasma Enhanced Chemical Vapor Deposition) process combining titanium target magnetron sputtering and PECVD in an Ar-CH 4 plasma. Films with various carbon contents have be